Low-Voltage Feedback Field Effect Transistor based Ion-Sensing: A Novel and Detailed Investigation for energy-efficient pH Sensor
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2024
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Abstract
�In this work, we present simulation-based results of a vertical nanowire feedback field effect transistor as an ion-sensor (ISFBFET) for accurate pH detection. The sensing mechanism of the investigated ISFBFET draws upon the principles of the Gouy-Chapman-Stern layer and the site-binding model. Along with SiO2 only, the deposition of Al2O3 on SiO2 as a sensitive layer is investigated. Sensitivity parameters are obtained from snap-back characteristics and are evaluated against work function (?G) engineering. At optimized conditions, ISFBFET results in ION/IOFF = 1010 and an SS = 0.03mV/dec with Al2O3-SiO2 improving the ION/IOFF by a factor of 1.24 (?G=4.7eV) and 5.53 (?G=5.1eV) over an oxide only gate insulator. Up to ?G?4.3eV, the sensing response of SiO2 is marginally better; whereas for ?G> 4.3eV, Al2O3-SiO2 has a better sensing response. Peak sensitivity for Al2O3 is observed at ?G=4.7eV, maximum constant current and voltage sensitivity observed is 3927 and 2.73 respectively. In the near future, due to low power functioning, steeper response, and high sensitivity, Al2O3-SiO2 based ISFBFET can replace conventional oxide-based ion sensors for pH detection in commercial applications. � 2016 IEEE. Personal use is permitted, but republication/redistribution requires IEEE permission.
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FBFET; Gate-Stacking; Gouy-Chapman-Stern; Ion-sensing; Site-Binding; steep subthreshold slope
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