The electrochemical 4-chlorophenol sensing properties of a plasma-treated multilayer graphene modified photolithography patterned platinum electrode

dc.contributor.authorKannan P.K.en_US
dc.contributor.authorGelamo R.V.en_US
dc.contributor.authorMorgan H.en_US
dc.contributor.authorSuresh P.en_US
dc.contributor.authorRout C.S.en_US
dc.date.accessioned2025-02-17T05:44:44Z
dc.date.issued2016
dc.description.abstractThe present work describes the electrochemical 4-chlorophenol (4-CP) sensing properties of multilayer graphene samples (MLG). In order to enhance the presence of oxygen functional groups and to increase the edge plane defects, oxygen plasma treatment is adopted. Raman, X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM) and atomic force microscopy (AFM) characterizations are used to investigate the effect of plasma treatment on MLG. Compared to pristine MLG, the oxygen plasma treated one shows increased oxidation current towards 4-CP. The sensor data exhibit high sensitivity and stability with high anti-interference property in the presence of other phenolic compounds including phenol, bisphenol, 2,3-chlorophenol, 2,3,4-nitrophenol and inorganic ions. � 2016 The Royal Society of Chemistry.en_US
dc.identifier.citation9en_US
dc.identifier.urihttp://dx.doi.org/10.1039/c6ra24136k
dc.identifier.urihttps://idr.iitbbs.ac.in/handle/2008/1225
dc.language.isoenen_US
dc.titleThe electrochemical 4-chlorophenol sensing properties of a plasma-treated multilayer graphene modified photolithography patterned platinum electrodeen_US
dc.typeArticleen_US

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