An improved I-V model of 4H-SiC MESFETs incorporating substrate trapping, surface trapping and thermal effects

dc.contributor.authorRao M.H.L.en_US
dc.contributor.authorNarasimha Murty N.V.L.en_US
dc.date.accessioned2025-02-17T04:49:12Z
dc.date.issued2013
dc.description.abstractAn improved analytical model for the DC characteristics of 4H-SiC MEtal Semiconductor Field Effect Transistors (MESFETs) is proposed. The model takes into account three major effects namely substrate trapping, surface trapping and thermal effects to describe the DC behavior of the device. The analytical model of I-V characteristics incorporate Caughey-Thomas model of field dependence electron mobility, substrate trapping of electrons by multiple deep level traps (which is the characteristic of 4H-SiC) and two-dimensional analysis of charge distribution under the gate. The collapse of drain current is observed on the I-V characteristics. This unique model proposed is a complete model which takes into consideration all the critical material defects and thermal effects with trapping. Hence the model behavior is very close to real time MESFET. � 2013 IEEE.en_US
dc.identifier.urihttp://dx.doi.org/10.1109/CDE.2013.6481346
dc.identifier.urihttps://idr.iitbbs.ac.in/handle/2008/361
dc.language.isoenen_US
dc.subject4H-SiCen_US
dc.subjectMESFETen_US
dc.subjectMultiple Trappingen_US
dc.subjectSelf heating effectsen_US
dc.titleAn improved I-V model of 4H-SiC MESFETs incorporating substrate trapping, surface trapping and thermal effectsen_US
dc.typeConference Paperen_US

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