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Please use this identifier to cite or link to this item: http://idr.iitbbs.ac.in/jspui/handle/2008/122
Title: Studies on Ni-Ti thin films deposited by bias assisted magnetron sputtering
Authors: Geetha Priyadarshini B.
Aich S.
Chakraborty M.
Keywords: Microscopy
Microstructure
Sputtering
Thin films
X-ray diffraction
Issue Date: 2011
Abstract: Co-sputtering from Ni and Ti elemental targets has been employed to deposit Ni-Ti thin films on Si (100) substrates. The influence of energetic particle bombardment on the microstructure of sputtered deposited Ni-Ti alloy films has not been well understood by researchers in the literature. Attempts are made here to investigate the microstructural and structural evolution taking place during the ion-bombardment on Ni-Ti thin films using Field Emission Scanning Electron Microscopy (FE-SEM), High Resolution Transmission Electron microscopy (HR-TEM) and Grazing Incidence X-ray diffraction (GIXRD). Films deposited at -100 V substrate bias, were amorphous exhibiting smooth and continuous microstructure. At an annealing temperature of 600 �C, the films were polycrystalline with grain size in the range of 15-25 nm containing a mixture of B19' and B2 phases.
URI: http://10.10.32.48:8080/jspui/handle/2008/122
Appears in Collections:Research Publications

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