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|Title:||Studies on Ni-Ti thin films deposited by bias assisted magnetron sputtering|
|Authors:||Geetha Priyadarshini B.|
|Abstract:||Co-sputtering from Ni and Ti elemental targets has been employed to deposit Ni-Ti thin films on Si (100) substrates. The influence of energetic particle bombardment on the microstructure of sputtered deposited Ni-Ti alloy films has not been well understood by researchers in the literature. Attempts are made here to investigate the microstructural and structural evolution taking place during the ion-bombardment on Ni-Ti thin films using Field Emission Scanning Electron Microscopy (FE-SEM), High Resolution Transmission Electron microscopy (HR-TEM) and Grazing Incidence X-ray diffraction (GIXRD). Films deposited at -100 V substrate bias, were amorphous exhibiting smooth and continuous microstructure. At an annealing temperature of 600 �C, the films were polycrystalline with grain size in the range of 15-25 nm containing a mixture of B19' and B2 phases.|
|Appears in Collections:||Research Publications|
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